HMA 500

HOLOGRAPHIC MASK ALIGNER - HMA500

Features :

High resolution

Large field

No image aberrations

High insensitivity to particles

High insensitivity to vibrations

I-line process compatible

Simple to use and maintain

Cost effective

Specifications :

Resolution 0.5 µm

Field size 150 mm x 150 mm

Alignment down to 0.15 µm (3s)

Stitching down to 0.15 µm (3s)

Depth of focus 1.2 µm

Exposure wavelength 364 nm

Substrate size up to 400 x 500 mm²

Substrate and hologram handling automatic

Dimensions 210 x 135 x 200 cm³ (W x D x H)

Applications :

	Flat panel displays (e.g. polysilicon AMLCDs, field-emission displays)
	Microsystems
	Integrated optics

Download pdf datasheet:

High resolution
Large field
No image aberrations
High insensitivity to particles
High insensitivity to vibrations
I-line process compatible
Simple to use and maintain
Cost effective

Resolution	0.5 µm
Field size	150 mm x 150 mm
Alignment	down to 0.15 µm (3s)
Stitching	down to 0.15 µm (3s)
Depth of focus	1.2 µm
Exposure wavelength	364 nm
Substrate size	up to 400 x 500 mm²
Substrate and hologram handling	automatic
Dimensions	210 x 135 x 200 cm³ (W x D x H)